Deposition of Ti-Based Thin Films on AISI 1020 Steel Substrates Using the Cathodic Cage Plasma Deposition Technique

Silva, Raul Felipe Barros da; Cardoso, Wandercleiton; Gontijo, Leonardo Cabral; Pimentel, Bruno Poubel; Viana, Pedro Rupf Pereira; Galdino, André Gustavo de Sousa

doi:10.1590/1980-5373-MR-2022-0291

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Articles • Mat. Res. 26 • 2023 • https://doi.org/10.1590/1980-5373-MR-2022-0291 linkcopy

Deposition of Ti-Based Thin Films on AISI 1020 Steel Substrates Using the Cathodic Cage Plasma Deposition Technique

Authorship SCIMAGO INSTITUTIONS RANKINGS

Abstract

The automotive industry is one of the largest industrial segments in the world market. The exhaust system of motor vehicles is responsible for the emission and treatment of toxic gasses released by the engine. In this sense, the application of titanium on an AISI 1020 steel substrate was carried out by plasma deposition using a cathode cage. The aim of this research was to evaluate the application of this material in the exhaust system of motor vehicles. The samples were characterized by scanning electron microscopy (SEM), confocal microscopy (CM), microhardness tests and corrosion resistance tests. The samples exhibited a thin film with higher titanium content and hardness than the uncoated sample. The corrosion potential also increased and the current density was lower than the uncoated sample. The conclusion is that the deposition of thin titanium films on AISI 1020 steel with CCPD has the potential to produce thin films.

Keywords:
Cathodic cage; Plasma deposition; AISI 1020 steel; thin films; titanium

Inner diameter	Ø 100 mm
Height	50 mm
Number of holes in the lid	37 holes
Number of side holes	04 holes
Dimensions of type 1 side tubes	Ø 15 mm x 30 mm long
Dimensions of type 2 side tubes	Ø 10 mm x 30 mm long

T_on [ms]	80-120
Working pressure [Pa]	106.66-123.99
Gas	Hydrogen
Flow rate [l/min]	8.000
I_m [A]	0.53-0.69
Deposition time	6 h after parameters stabilization
Coating	Pure Ti grade 2 and TiO₂
V_m [V]	146-153
Temperature [K]	723

Initial potential [V]	- 0.70
Final potential [V]	+ 0.70
Scanning speed [V/s]	0.001
Step [V]	0.005
Reference electrode	Calomel
Counter electrode	Platinum

Chemical element	Chemical composition (wt%)	Chemical composition UNS G10200 (wt%)
C	0.21	0.17-0.23
Mn	0.52	0.30-0.60
P	0.02	≤ 0.040
S	0.02	≤ 0.050
Si	0.11	-
Cr	0.10	-
Mo	0.02	-
Ni	0.06	-
Cu	0.29	-
Ti	< 0.01	-
Fe	Balance	Balance

Chemical	Chemical composition (wt%)
TiO₂	99.03
Al₂O₃	0.41
SiO₂	0.28
P₂O₅	0.28

Chemical Element	Sample A	Sample B	Sample C	Sample D
Fe	99.6 ± 0.2	95. 0 ± 0.2	95.0 ± 0.2	96.4 ± 0.2
O	0.4 ± 0.2	4.7 ± 0.2	4.7 ± 0.2	3.5 ± 0.2
Ti	-	0.3 ± 0.1	0.3 ± 0.1	0.1 ± 0.1

Sample	Sample B	Sample C	Sample D
Sample	Dz (nm)	Dz (nm)	Dz (nm)
1	138.27	119.33	316.62
2	101.65	116.18	304.23
3	149.12	129.53	291.68
4	126.30	117.61	300.66
Average ± standard deviation	128.84 ± 20.38	120.66 ± 6.05	303.30 ± 10.33

Sample	Load (mN)	Hardness (HV)
A	50.79 ± 0.17	148.13 ± 03.94
B	50.82 ± 0.16	326.93 ± 37.30
C	50.95 ± 0.01	319.88 ± 15.05
D	50.80 ± 0.15	315.47 ± 44.64

Sample	Corrosion potential (V)
A	- 0.55 ± 0.01
B	- 0.51 ± 0.01
C	- 0.52 ± 0.01
D	- 0.51 ± 0.01

location_on

ABM, ABC, ABPol UFSCar - Dep. de Engenharia de Materiais, Rod. Washington Luiz, km 235, 13565-905 - São Carlos - SP- Brasil. Tel (55 16) 3351-9487 - São Carlos - SP - Brazil
E-mail: pessan@ufscar.br

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[1] Sample A = 100% Kapton® tape and no thin film; Sample B = Partial Kapton® tape and no thin film; Sample C = Partial Kapton® tape and titanium thin film; Sample D = Partial Kapton® tape and titanium dioxide thin film.