TY  - JOUR 
T1  - Plasma ion implantation of nitrogen into silicon: high resolution x-ray diffraction
JO  - Brazilian Journal of Physics
A1  - Beloto, A. F.
A1  - Abramof, E.
A1  - Ueda, M.
A1  - Berni, L. A.
A1  - Gomes, G. F.
SN  - 0103-9733
UL  - 10.1590/S0103-97331999000400032
VL  - 29 
Y1  - 1999
PB  - Brasil 
ER  -